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High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

N.A. Morrison; S.E. Rodil; A.C. Ferrari; J. Robertson; W.I. Milne

作者N.A. Morrison; S.E. Rodil; A.C. Ferrari; J. Robertson; W.I. Milne
卷第337卷
印刷ISSN0040-6090
文件大小216.63KB
发表时间1999
DOI10.1016/s0040-6090(98)01187-0
页码71-73

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