Observation of Extremely Low Defect Densities in Silicon Wafers

• 期刊名称Japanese Journal of Applied Physics
• 作者Schmolke, Rüdiger; Gräf, Dieter; Kirchner, Ralf; Schauer, Reinhard; Werner, Norbert; Mayer, Erwin-Peter; Wagner, Peter
• 卷第38卷
• 印刷ISSN0021-4922
• 电子ISSN1347-4065
• 文件大小181.89KB
• 发表时间1999-4-15
• DOI10.1143/JJAP.38.1852
• 页码1852-1857