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Electrical and structural properties of low temperature boron- and phosphorus-doped polycrystalline silicon thin films prepared by ECR-CVD

Electrical and structural properties of low temperature boron- and phosphorus-doped polycrystalline silicon thin films prepared by ECR-CVD

H.L Hsiao; Y.Y Shieh; R.S Lee; R.Y Wang; K.C Wang; H.L Hwang; A.B Yang
  • 作者H.L Hsiao; Y.Y Shieh; R.S Lee; R.Y Wang; K.C Wang; H.L Hwang; A.B Yang
  • 卷第142卷
  • 印刷ISSN0169-4332
  • 文件大小2162.23KB
  • 发表时间1999
  • DOI10.1016/s0169-4332(98)00683-7
  • 页码400-406
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