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Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution

Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution

H.L Hsiao; H.L Hwang; A.B Yang; L.W Chen; T.R Yew
  • 作者H.L Hsiao; H.L Hwang; A.B Yang; L.W Chen; T.R Yew
  • 卷第142卷
  • 印刷ISSN0169-4332
  • 文件大小448.10KB
  • 发表时间1999
  • DOI10.1016/s0169-4332(98)00701-6
  • 页码316-321
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