SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, Thomas I.; Brock, Phillip J.; Di Pietro, Richard A.; Allen, Robert D.; Opitz, Juliann; Sooriyakumaran, Ratnam; Hofer, Donald C.; Mewherter, Ann M.; Cui, Yuping; Yan, Wendy; Worth, G.; Moreau, Wayne M.; Meute, Jeff; Byers, Jeff D.; Rich, Georgia K.; McCallum, Martin; Jayaraman, Saikumar; Vicari, Richard; Cagle, Joy; Sun, Shenliang; Hullihen, Karen A.; Conley, Will
- 作者Wallow, Thomas I.; Brock, Phillip J.; Di Pietro, Richard A.; Allen, Robert D.; Opitz, Juliann; Sooriyakumaran, Ratnam; Hofer, Donald C.; Mewherter, Ann M.; Cui, Yuping; Yan, Wendy; Worth, G.; Moreau, Wayne M.; Meute, Jeff; Byers, Jeff D.; Rich, Georgia K.; McCallum, Martin; Jayaraman, Saikumar; Vicari, Richard; Cagle, Joy; Sun, Shenliang; Hullihen, Karen A.; Conley, Will
- 卷第3678卷
- 印刷ISSN0277-786X
- 文件大小1336.82KB
- 发表时间1999
- DOI10.1117/12.350211
- 页码26-35