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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - <title>Flare impact on the intrafield CD control for sub-0.25-μm patterning</title>

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Flare impact on the intrafield CD control for sub-0.25-μm patterning

Luce, Emmanuelle; Minghetti, Blandine; Schiavone, Patrick; Toublan, Olivier; Weill, Andre P.; Van den Hove, Luc
  • 作者Luce, Emmanuelle; Minghetti, Blandine; Schiavone, Patrick; Toublan, Olivier; Weill, Andre P.; Van den Hove, Luc
  • 卷第3679卷
  • 印刷ISSN0277-786X
  • 文件大小4040.21KB
  • 发表时间1999
  • DOI10.1117/12.354349
  • 页码368-381
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