SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Application of a new approach to optical proximity correction
Rosenbusch, Anja; Hourd, Andrew C.; Juffermans, Casper A. H.; Kirsch, Hartmut; Lalanne, Frederic P.; Maurer, Wilhelm; Romeo, Carmelo; Ronse, Kurt G.; Schiavone, Patrick; Simecek, Michal; Toublan, Olivier; Vermeulen, Tom; Watson, John G.; Ziegler, Wolfram; Zimmermann, Rainer; Van den Hove, Luc
- 作者Rosenbusch, Anja; Hourd, Andrew C.; Juffermans, Casper A. H.; Kirsch, Hartmut; Lalanne, Frederic P.; Maurer, Wilhelm; Romeo, Carmelo; Ronse, Kurt G.; Schiavone, Patrick; Simecek, Michal; Toublan, Olivier; Vermeulen, Tom; Watson, John G.; Ziegler, Wolfram; Zimmermann, Rainer; Van den Hove, Luc
- 卷第3679卷
- 印刷ISSN0277-786X
- 文件大小1987.27KB
- 发表时间1999
- DOI10.1117/12.354378
- 页码639-647