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SiC Recession Caused by SiO2 Scale Volatility under Combustion Conditions: II, Thermodynamics and Gaseous-Diffusion Model

SiC Recession Caused by SiO2 Scale Volatility under Combustion Conditions: II, Thermodynamics and Gaseous-Diffusion Model

Elizabeth J. Opila; James L. Smialek; Raymond C. Robinson; Dennis S. Fox; Nathan S. Jacobson
  • 作者Elizabeth J. Opila; James L. Smialek; Raymond C. Robinson; Dennis S. Fox; Nathan S. Jacobson
  • 卷第82卷
  • 期第7期
  • 印刷ISSN0002-7820
  • 电子ISSN1551-2916
  • 文件大小227.41KB
  • 发表时间1999
  • DOI10.1111/j.1151-2916.1999.tb02005.x
  • 页码1826-1834
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