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Modification of the refractive index and the dielectric constant of silicon dioxide by means of ion implantation

Modification of the refractive index and the dielectric constant of silicon dioxide by means of ion implantation

J.W Swart; J.A Diniz; I Doi; M.A.B de Moraes
  • 作者J.W Swart; J.A Diniz; I Doi; M.A.B de Moraes
  • 印刷ISSN0168-583X
  • 文件大小166.55KB
  • 发表时间2000
  • DOI10.1016/s0168-583x(99)00650-3
  • 页码171-176
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