Origin of Infrared Photoluminescence of Nanocrystalline Si in SiO 2 Films
- 期刊名称Japanese Journal of Applied Physics
- 作者Takahashi, Hiroshi; Nishimura, Toshio; Hashimoto, Yusuke; Takahashi, Shinichi; Kuwano, Hiroshi
- 卷第39卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小88.85KB
- 发表时间2000-6-15
- DOI10.1143/jjap.39.3474
- 页码3474-3477