[IEEE 19th International Symposium on Discharge and Electrical Insulation in Vacuum - Xi'an, China (18-22 Sept. 2000)] Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) - Choice of optimal technological parameters of the combined strengthening on the basis of plasma-ionic, ionic-beam and laser technologies
- 作者Kostyuk, G.I.
- 卷第2卷
- 文件大小308.17KB
- 发表时间2000
- DOI10.1109/deiv.2000.879082
- 页码682-685
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