[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - How to monitor a sub-keV USJ implant
- 作者Bayha, B.; Loeffelmacher, D.; Lerch, W.; Downey, D.F.; Arevalo, E.A.
- 文件大小402.66KB
- 发表时间2000
- DOI10.1109/.2000.924230
- 页码623-626
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