Diffusion of implanted nitrogen in silicon

Shaik Adam, Lahir; Law, Mark E.; Jones, Kevin S.; Dokumaci, Omer; Murthy, C. S.; Hegde, Suri

期刊名称Journal of Applied Physics
作者Shaik Adam, Lahir; Law, Mark E.; Jones, Kevin S.; Dokumaci, Omer; Murthy, C. S.; Hegde, Suri
卷第87卷
期第5期
印刷ISSN0021-8979
文件大小308.71KB
发表时间2000
DOI10.1063/1.372173

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