Stress-induced high-field gate leakage current in ultra-thin gate oxide

• 作者Jianlin Wei; Lingfeng Mao; Mingzhen Xu; Changhua Tan; Xiaorong Duan
• 卷第44卷
• 期第6期
• 印刷ISSN0038-1101
• 文件大小119.15KB
• 发表时间2000
• DOI10.1016/s0038-1101(00)00008-3
• 页码977-980