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Fabrication of masks for electron-beam projection lithography

Fabrication of masks for electron-beam projection lithography

M. Lercel; C. Magg; M. Barrett; K. Collins; M. Trybendis; N. Caldwell; R. Jeffer; L. Bouchard
  • 作者M. Lercel; C. Magg; M. Barrett; K. Collins; M. Trybendis; N. Caldwell; R. Jeffer; L. Bouchard
  • 文件大小864.53KB
  • 发表时间2000
  • DOI10.1116/1.1314370
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