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Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography System

Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography System

B. E. Maile; W. Henschel; H. Kurz; B. Rienks; R. Polman; P. Kaars

作者B. E. Maile; W. Henschel; H. Kurz; B. Rienks; R. Polman; P. Kaars
文件大小735.85KB
发表时间2000
DOI10.1143/JJAP.39.6836

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