Antimony Clustering due to High-dose Implantation
- 期刊名称MRS Proceedings
- 作者Shibahara, Kentaro; Onimatsu, Dai
- 卷第610卷
- 电子ISSN1946-4274
- 文件大小450.75KB
- 发表时间2000-1
- DOI10.1557/proc-610-b8.5
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