SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Etching 200-mm diameter SCALPEL masks with the ASE process
Johnston, Ian R.; Ashraf, Huma; Bhardwaj, Jy K.; Hopkins, Janet; Hynes, Alan M.; Nicholls, Glenn; McAuley, Serrita A.; Hall, Stephen; Atabo, Lilian; Bogart, Gregory R.; Kornblit, Avi; Novembre, Anthony E.; Dobisz, Elizabeth A.
- 作者Johnston, Ian R.; Ashraf, Huma; Bhardwaj, Jy K.; Hopkins, Janet; Hynes, Alan M.; Nicholls, Glenn; McAuley, Serrita A.; Hall, Stephen; Atabo, Lilian; Bogart, Gregory R.; Kornblit, Avi; Novembre, Anthony E.; Dobisz, Elizabeth A.
- 卷第3997卷
- 印刷ISSN0277-786X
- 文件大小3021.54KB
- 发表时间2000
- DOI10.1117/12.390054
- 页码184-193