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Effect of deposition conditions on internal stresses and microstructure of reactively sputtered tungsten nitride films

Effect of deposition conditions on internal stresses and microstructure of reactively sputtered tungsten nitride films

Y.G Shen; Y.W Mai

作者Y.G Shen; Y.W Mai
卷第127卷
印刷ISSN0257-8972
文件大小316.71KB
发表时间2000
DOI10.1016/s0257-8972(00)00664-2
页码238-245

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