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Development of advanced silylation process for 157-nm lithography

Development of advanced silylation process for 157-nm lithography

Isao Satou; Manabu Watanabe; Hiroyuki Watanabe; Toshiro Itani

作者Isao Satou; Manabu Watanabe; Hiroyuki Watanabe; Toshiro Itani
印刷ISSN0167-9317
文件大小517.91KB
发表时间2001
DOI10.1016/s0167-9317(01)00502-0
页码571-577

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