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Effects of thickness on the electrical properties of metalorganic chemical vapor deposited Pb(Zr,âTi)O[sub 3] (25â100 nm) thin films on LaNiO[sub 3] buffered Si

Effects of thickness on the electrical properties of metalorganic chemical vapor deposited Pb(Zr,âTi)O[sub 3] (25â100 nm) thin films on LaNiO[sub 3] buffered Si

Lin, C. H.; Friddle, P. A.; Ma, C. H.; Daga, A.; Chen, Haydn

期刊名称Journal of Applied Physics
作者Lin, C. H.; Friddle, P. A.; Ma, C. H.; Daga, A.; Chen, Haydn
卷第90卷
期第3期
印刷ISSN0021-8979
文件大小356.25KB
发表时间2001
DOI10.1063/1.1383262

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