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Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt Formation Mechanisms and Associated Properties

Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt Formation Mechanisms and Associated Properties

Londergan, Ana R.; Nuesca, Guillermo; Goldberg, Cindy; Peterson, Gregory; Kaloyeros, Alain E.; Arkles, Barry; Sullivan, John J.
  • 期刊名称Journal of The Electrochemical Society
  • 作者Londergan, Ana R.; Nuesca, Guillermo; Goldberg, Cindy; Peterson, Gregory; Kaloyeros, Alain E.; Arkles, Barry; Sullivan, John J.
  • 卷第148卷
  • 期第1期
  • 印刷ISSN0013-4651
  • 文件大小789.68KB
  • 发表时间2001
  • DOI10.1149/1.1344535
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