Structure of defects in silicon oxynitride films
- 作者S. Hasegawa; S. Sakamori; M. Futatsudera; T. Inokuma; Y. Kurata
- 卷第89卷
- 期第5期
- 文件大小384.31KB
- 发表时间2001
- DOI10.1063/1.1343895
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