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Improvement of hydrogenated amorphous silicon properties with increasing contribution of SiH[sub 3] to film growth

Improvement of hydrogenated amorphous silicon properties with increasing contribution of SiH[sub 3] to film growth

Kessels, W. M. M.; Boogaarts, M. G. H.; Hoefnagels, J. P. M.; Schram, D. C.; van de Sanden, M. C. M.
  • 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • 作者Kessels, W. M. M.; Boogaarts, M. G. H.; Hoefnagels, J. P. M.; Schram, D. C.; van de Sanden, M. C. M.
  • 卷第19卷
  • 期第3期
  • 印刷ISSN0734-2101
  • 文件大小331.65KB
  • 发表时间2001
  • DOI10.1116/1.1365131
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