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Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride films

Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride films

Bose, Mohua; Basa, D. K.; Bose, D. N.

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Bose, Mohua; Basa, D. K.; Bose, D. N.
卷第19卷
期第1期
印刷ISSN0734-2101
文件大小335.97KB
发表时间2001
DOI10.1116/1.1322642

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