Dislocation-Free Czochralski Silicon Crystal Growth without Dash Necking
Huang, Xinming; Taishi, Toshinori; Yonenaga, Ichiro; Hoshikawa, Keigo
- 期刊名称Japanese Journal of Applied Physics
- 作者Huang, Xinming; Taishi, Toshinori; Yonenaga, Ichiro; Hoshikawa, Keigo
- 卷第40卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小903.80KB
- 发表时间2001-1-15
- DOI10.1143/jjap.40.12
- 页码12-17