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Analysis and modeling of residual stress in diamond thin film deposited by the hot-filament chemical vapor deposition process

Analysis and modeling of residual stress in diamond thin film deposited by the hot-filament chemical vapor deposition process

Cha, Seung I.; Hong, Soon H.

期刊名称Journal of Materials Research
作者Cha, Seung I.; Hong, Soon H.
卷第16卷
期第7期
印刷ISSN0884-2914
电子ISSN2044-5326
文件大小656.69KB
发表时间2001-7
DOI10.1557/JMR.2001.0267
页码1953-1959

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