Electrical Properties of Ni–Cr–N Thin Films Deposited by Multitarget Reactive Sputtering

• 期刊名称Japanese Journal of Applied Physics
• 作者Sato, Yuichi; Watanabe, Masaya; Sato, Susumu
• 卷第40卷
• 印刷ISSN0021-4922
• 电子ISSN1347-4065
• 文件大小179.40KB
• 发表时间2001-8-15
• DOI10.1143/JJAP.40.5091
• 页码5091-5094