Catalytic Chemical Sputtering: A Novel Method for Obtaining Large-Grain Polycrystalline Silicon
- 期刊名称Japanese Journal of Applied Physics
- 作者Matsumura, Hideki; Kamesaki, Koji; Masuda, Atsushi; Izumi, Akira
- 卷第40卷
- 印刷ISSN0021-4922
- 文件大小429.04KB
- 发表时间2001-3-15
- DOI10.1143/JJAP.40.L289
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