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Effect of Plasma Off Time on the Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Pulse-Modulated Plasma Deposition

Effect of Plasma Off Time on the Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Films Prepared by Pulse-Modulated Plasma Deposition

A. Tabata; M. Sekito; T. Mizutani; Y. Suzuoki

作者A. Tabata; M. Sekito; T. Mizutani; Y. Suzuoki
文件大小79.96KB
发表时间2001
DOI10.1143/JJAP.40.6728

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