[IEEE 2001 IEEE Industry Applications Society 36th Annual Meeting - IAS'01 - Chicago, IL, USA (30 Sept.-4 Oct. 2001)] Conference Record of the 2001 IEEE Industry Applications Conference. 36th IAS Annual Meeting (Cat. No.01CH37248) - Single-stage plasma-chemical process for particulates, NO/sub x/ and SO/sub x/ simultaneous removal
- 作者Kuroki, T.; Takahashi, M.; Okubo, M.; Yamamoto, T.
- 卷第1卷
- 文件大小100.36KB
- 发表时间2001
- DOI10.1109/ias.2001.955492
- 页码675-679