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SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - <title>Mask definition by nanoimprint lithography</title>

SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Mask definition by nanoimprint lithography

Lyebyedyev, D.; Scheer, Hella-Christin; Behringer, Uwe F. W.

作者Lyebyedyev, D.; Scheer, Hella-Christin; Behringer, Uwe F. W.
卷第4349卷
印刷ISSN0277-786X
文件大小574.81KB
发表时间2001
DOI10.1117/12.425079
页码82-85

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