SPIE Proceedings [SPIE 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 13 November 2000)] 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Mask manufacturing contribution on 248-nm and 193-nm lithography performances
- 作者Barberet, Alexandra; Fanget, Gilles L.; Richoilley, Jean-Charles; Tissier, Michel; Quere, Yves; Behringer, Uwe F. W.
- 卷第4349卷
- 印刷ISSN0277-786X
- 文件大小560.76KB
- 发表时间2001
- DOI10.1117/12.425081
- 页码90-98
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