A Novel Platform for Production-worthy ArF Resist
Kim, Hyun-Woo; Choi, Sang-Jun; Jung, Dong-Won; Lee, Sook; Lee, Sung-Ho; Kang, Yool; Woo, Sang-Gyun; Moon, Joo-Tae; Kavanagh, Robert; Barclay, George; Orsula, George; Mattia, Joe; Caporale, Stefan; Adams, Tim; Tanaka, Tsutomu; Kang, Doris
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Kim, Hyun-Woo; Choi, Sang-Jun; Jung, Dong-Won; Lee, Sook; Lee, Sung-Ho; Kang, Yool; Woo, Sang-Gyun; Moon, Joo-Tae; Kavanagh, Robert; Barclay, George; Orsula, George; Mattia, Joe; Caporale, Stefan; Adams, Tim; Tanaka, Tsutomu; Kang, Doris
- 卷第14卷
- 期第3期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小667.68KB
- 发表时间2001
- DOI10.2494/photopolymer.14.363
- 页码363-371