[IEEE 2001 IEEE International Integrated Reliability Workshop. Final Report - Lake Tahoe, CA, USA (15-18 Oct. 2001)] 2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) - Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)
Conley, J.F.; Ono, Y.; Tweet, D.J.; Zhuang, W.; Khaiser, M.; Solanki, R.
- 作者Conley, J.F.; Ono, Y.; Tweet, D.J.; Zhuang, W.; Khaiser, M.; Solanki, R.
- 文件大小456.09KB
- 发表时间2001
- DOI10.1109/irws.2001.993909
- 页码11-15