ChemInform Abstract: Interlayer Mediated Epitaxy of Cobalt Silicide on Silicon (100) from Low Temperature Chemical Vapor Deposition of Cobalt.
- 作者Ana R. Londergan; Guillermo Nuesca; Cindy Goldberg; Gregory Peterson; Alain E. Kaloyeros; Barry Arkles; John J. Sullivan
- 卷第32卷
- 期第20期
- 印刷ISSN0931-7597
- 电子ISSN1522-2667
- 文件大小32.24KB
- 发表时间2001
- DOI10.1002/chin.200120233
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