Low temperature oxidation of CVD SiC by electron cyclotron resonance plasma
Takashi Goto; Hiroshi Masumoto; Mineo Niizuma
- 作者Takashi Goto; Hiroshi Masumoto; Mineo Niizuma
- 卷第75卷
- 印刷ISSN0254-0584
- 文件大小230.59KB
- 发表时间2002
- DOI10.1016/s0254-0584(02)00068-8
- 页码235-240