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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Strong correlation between dielectric reliability and charge trapping in SiO/sub 2//Al/sub 2/O/sub 3/ gate stacks with TiN electrodes

[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Strong correlation between dielectric reliability and charge trapping in SiO/sub 2//Al/sub 2/O/sub 3/ gate stacks with TiN electrodes

Kerber, A.; Cartier, E.; Degraeve, R.; Pantisano, L.; Roussel, P.; Groeseneken, G.
  • 作者Kerber, A.; Cartier, E.; Degraeve, R.; Pantisano, L.; Roussel, P.; Groeseneken, G.
  • 文件大小321.55KB
  • 发表时间2002
  • DOI10.1109/vlsit.2002.1015396
  • 页码76-77
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