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Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon films

Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon films

Valentini, L.; Kenny, J. M.; Montereali, R. M.; Lozzi, L.; Santucci, S.

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Valentini, L.; Kenny, J. M.; Montereali, R. M.; Lozzi, L.; Santucci, S.
卷第20卷
期第4期
印刷ISSN0734-2101
文件大小376.81KB
发表时间2002
DOI10.1116/1.1479359

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