Chemical interaction between atomic-layer-deposited HfO[sub 2] thin films and the Si substrate
Cho, Moonju; Park, Jaehoo; Park, Hong Bae; Hwang, Cheol Seong; Jeong, Jaehack; Hyun, Kwang Soo
- 期刊名称Applied Physics Letters
- 作者Cho, Moonju; Park, Jaehoo; Park, Hong Bae; Hwang, Cheol Seong; Jeong, Jaehack; Hyun, Kwang Soo
- 卷第81卷
- 期第2期
- 印刷ISSN0003-6951
- 文件大小562.06KB
- 发表时间2002
- DOI10.1063/1.1492320