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Chemical interaction between atomic-layer-deposited HfO[sub 2] thin films and the Si substrate

Chemical interaction between atomic-layer-deposited HfO[sub 2] thin films and the Si substrate

Cho, Moonju; Park, Jaehoo; Park, Hong Bae; Hwang, Cheol Seong; Jeong, Jaehack; Hyun, Kwang Soo
  • 期刊名称Applied Physics Letters
  • 作者Cho, Moonju; Park, Jaehoo; Park, Hong Bae; Hwang, Cheol Seong; Jeong, Jaehack; Hyun, Kwang Soo
  • 卷第81卷
  • 期第2期
  • 印刷ISSN0003-6951
  • 文件大小562.06KB
  • 发表时间2002
  • DOI10.1063/1.1492320
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