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Heisenberg-limited interferometry and photolithography with nonlinear four-wave mixing

Heisenberg-limited interferometry and photolithography with nonlinear four-wave mixing

Gerry, Christopher C.; Benmoussa, Adil
  • 期刊名称Physical Review A
  • 作者Gerry, Christopher C.; Benmoussa, Adil
  • 卷第65卷
  • 期第3期
  • 印刷ISSN1050-2947
  • 电子ISSN1094-1622
  • 文件大小78.46KB
  • 发表时间2002-2-26
  • DOI10.1103/PhysRevA.65.033822
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