Surfactant-assisted atomic-level engineering of spin valves
Chopra, Harsh Deep; Yang, David X.; Chen, P. J.; Egelhoff, W. F.
- 期刊名称Physical Review B
- 作者Chopra, Harsh Deep; Yang, David X.; Chen, P. J.; Egelhoff, W. F.
- 卷第65卷
- 期第9期
- 印刷ISSN0163-1829
- 电子ISSN1095-3795
- 文件大小581.65KB
- 发表时间2002-2-21
- DOI10.1103/PhysRevB.65.094433