Spectroscopic ellipsometry study of ion-implanted Si(100) wafers
- 期刊名称Journal of Applied Physics
- 作者Tsunoda, Kazuaki; Adachi, Sadao; Takahashi, Mitsutoshi
- 卷第91卷
- 期第5期
- 印刷ISSN0021-8979
- 文件大小352.68KB
- 发表时间2002
- DOI10.1063/1.1446231
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