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Evaluation of Weakly Ionized Plasma Channel by Accumulation Effect of Charged Particles Using High-Repetition-Rate KrF Excimer Laser

Evaluation of Weakly Ionized Plasma Channel by Accumulation Effect of Charged Particles Using High-Repetition-Rate KrF Excimer Laser

Yamaura, Michiteru; Hayashi, Nobuya; Ihara, Satoshi; Satoh, Saburoh; Yamabe, Chobei
  • 期刊名称Japanese Journal of Applied Physics
  • 作者Yamaura, Michiteru; Hayashi, Nobuya; Ihara, Satoshi; Satoh, Saburoh; Yamabe, Chobei
  • 卷第41卷
  • 印刷ISSN0021-4922
  • 电子ISSN1347-4065
  • 文件大小116.24KB
  • 发表时间2002-11-15
  • DOI10.1143/JJAP.41.6394
  • 页码6394-6397
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