Behavior of dislocations due to thermal shock in B-doped Si seed in Czochralski Si crystal growth

• 作者Toshinori Taishi; Xinming Huang; Tiefeng Wang; Ichiro Yonenaga; Keigo Hoshikawa
• 卷第241卷
• 期第3期
• 印刷ISSN0022-0248
• 文件大小240.82KB
• 发表时间2002
• DOI10.1016/s0022-0248(02)01246-0
• 页码277-282