Si-Substituted Ultrathin Ferroelectric Films
- 期刊名称Japanese Journal of Applied Physics
- 作者Kijima, Takeshi; Ishiwara, Hiroshi
- 卷第41卷
- 印刷ISSN0021-4922
- 文件大小107.79KB
- 发表时间2002-6-15
- DOI10.1143/jjap.41.l716
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