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In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si:H solar cells

In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si:H solar cells

Atsushi Masuda; Yoriko Ishibashi; Kenji Uchida; Koji Kamesaki; Akira Izumi; Hideki Matsumura
  • 作者Atsushi Masuda; Yoriko Ishibashi; Kenji Uchida; Koji Kamesaki; Akira Izumi; Hideki Matsumura
  • 卷第74卷
  • 印刷ISSN0927-0248
  • 文件大小89.33KB
  • 发表时间2002
  • DOI10.1016/s0927-0248(02)00130-7
  • 页码373-377
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