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[ASME ASME 2002 International Mechanical Engineering Congress and Exposition - New Orleans, Louisiana, USA (November 17–22, 2002)] Microelectromechanical Systems - Novel Lithography-Based Approaches to Pattern Layer-by-Layer Self-Assembled Thin Films

[ASME ASME 2002 International Mechanical Engineering Congress and Exposition - New Orleans, Louisiana, USA (November 17–22, 2002)] Microelectromechanical Systems - Novel Lithography-Based Approaches to Pattern Layer-by-Layer Self-Assembled Thin Films

Cui, Tianhong; Lvov, Yuri; Hua, Feng; Shi, Jingshi

作者Cui, Tianhong; Lvov, Yuri; Hua, Feng; Shi, Jingshi
卷第2002卷
文件大小766.39KB
发表时间2002
DOI10.1115/imece2002-32731
页码603-610

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