SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Factors influencing CD-SEM metrology
- 作者Sicignano, Albert; Nikitin, Arkady V.; Yeremin, Dmitriy Y.; Sandy, Matthew; Goldburt, E. T.; Herr, Daniel J. C.
- 卷第4689卷
- 印刷ISSN0277-786X
- 文件大小784.42KB
- 发表时间2002
- DOI10.1117/12.473447
- 页码1179-1189
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