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SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - <title>Application of lithography simulation in reticle inspection</title>

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Application of lithography simulation in reticle inspection

Kalus, Christian K.; Wildfeuer, Robert; Behringer, Uwe F. W.
  • 作者Kalus, Christian K.; Wildfeuer, Robert; Behringer, Uwe F. W.
  • 卷第4764卷
  • 印刷ISSN0277-786X
  • 文件大小1016.36KB
  • 发表时间2002
  • DOI10.1117/12.479362
  • 页码51-59
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